PLANARGARD    |    ENTEGRIS

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​Planargard® CS: Bulk and Point-of-Use Cartridge Filters

Brand Name: Mykrolis
Model: Planargard® CS
​Description
High Retention Graded- Density Filter Technology
The Planargard CS filter relies on a graded-density depth filter design that enables it to retain defectcausing agglomerates in each of its layers. 
This design provides excellent retention of agglomerates while allowing desired slurry particles to reach the surface of the wafer. Because particles are retained throughout the filter matrix rather than on a single surface, the potential for premature filter “plugging” is greatly reduced.

DETAIL
​Performance
Planargard filters remove only those particles that are disruptive to the CMP process, not all particles. The particle size distribution of the desired slurry particles does not change after filtration. As a result, consistent slurry is delivered to your process.
Filter Selection
Mykrolis offers Planargard filter options to match your application filtration objectives. Mykrolis’s worldwide technical support team stands ready to support you with product recommendations and evaluation assistance.

Certificate of Analysis 
Each filter comes with a Certificate of Analysis. The Certificate of Analysis provides relevant data regarding retention and flow, and insures that the cartridges were made with the highest quality. Mykrolis offers Planargard filter options to match your application filtration objectives. Mykrolis’s worldwide technical support team stands ready to support you with product recommendations and evaluation assistance.
Non-woven membrane design 
Enables filter to retain defect-causing agglomerates with high efficiency.
Removes only those particles that are disruptive
The particle size distribution of the “working” slurry particles does not change after filtration. 
Available in a range of sizes from 1.0 μm, 0.5 μm, 0.3 μm and 0.2 μm
Designed to meet the needs for bulk and point-of-use filtration of CMP slurries.
 
SPECIFICATION
Materials 
All polypropylene construction.
Cartridge O-ring: EPR, 2-222
Maximum Operating Conditions 
Maximum Forward Differential Pressure: 0.48 MPa (4.8 bar, 70 psi) @ 25° C

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MORE INFO

​Planargard Point-of-Use ® Cartridge Filters

Brand Name: Mykrolis
Model: Planargard Point-of-Use ®
Description
Graded-Density Filter Technology 
The Planargard filter relies on a graded-density depth filter design that enables it to retain defectcausing agglomerates in each of its four layers. 
This design provides excellent retention of agglomerates while allowing desired slurry particles to reach the surface of the wafer. Because particles are retained throughout the filter matrix rather than on a single surface, the potential for premature filter “plugging” is greatly reduced.

DETAIL
Performance
Planargard filters remove only those particles that are disruptive to the CMP process, not all particles. The particle size distribution of the desired slurry particles does not change after filtration. As a result, consistent slurry is delivered to your process. 
Filter Selection
Mykrolis offers Planargard filter options to match your application filtration objectives. For example to minimize wafer defects when polishing a polysilicon layer, a tight structure (i.e., CMP5) is recommended. If filter life is a priority, a more open structure (i.e.,CM13) may be used. Mykrolis’s worldwide technical support team stands

ready to support you with product recommendations and evaluation assistance. 
The Effect of Filtration on Working Particles 
Results of tests conducted by Mykrolis demonstrate that Planargard cartridges do not affect the particle size distribution of working particles. Our testing also shows that filters tighter than CMP1 can remove desirable working particles, causing premature plugging and reduced removal rates. 
Relies on a graded-density depth filter design 
Enables filter to retain defect-causing agglomerates in each of its four layers. 
Removes only those particles that are disruptive 
The particle size distribution of the desired slurry particles does not change after filtration. 
Available in a range of sizes from < 1 μm to 50 μm 
Designed to meet the needs of specific slurry applications. 
 
SPECIFICATION
Materials 
All polypropylene construction 
Cartridge O-ring: EPR 
Connections 
Code 0, 2-222 double O-rings 
Maximum Operating Conditions 
Maximum Forward Differential Pressure: 0.48 MPa (4.8 bar, 70 psi) @ 25° C