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Post-CMP Cleaning Brushes    |   ENTEGRIS


Wafer Processing
Offering safe wafer transport solutions that preserve material purity and product integrity during processing, storing and transporting wafers within the fab environment and from facility to facility throughout the world.
Offering a complete range of wafer processing products to improve yields and increase productivity for device manufacturers as they advance their manufacturing process.

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Post-CMP Cleaning Brushes
Planarcore® PVA Brushes are designed to deliver superior performance and wafer-to-wafer uniformity in post CMP wafer cleaning applications.
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CMP Pad Conditioners
Application-tuned performance delivers precise and consistent pad surface morphology and material removal rate.
FILTERFINE ADVANCED TECHNOLOGY SDN BHD
32, Persiaran Mahsuri 1/2,
11900 Bayan Baru, Penang, Malaysia.
Tel : 04-6435761  Fax : 04-6435793
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Copyright @ Filterfine Advanced Technology
2018/2019
  • HOME
  • INDUSTRIES
  • PRODUCT & SERVICES
    • ENTEGRIS >
      • Gas Filtration & Purification
      • Liquid Filtration & Purification
      • POCO Premium Graphite
      • CMP Pad Conditioners
      • Post-CMP Cleaning Brushes
      • Fluid Management
      • Sensing and Control
    • LEVITRONIX >
      • Pumps
      • Pump-Tank Mixers
      • Flow Sensors
      • POU Pressure Kit
      • Dynamic Flow Controller
      • Consoles
      • BEARINGLESS PUMP
      • FLOWMETER
    • VAISALA
    • BROOKS >
      • 1661E SERIES
      • GF100
      • GF120
      • GF125
      • CMC SERIES
      • CMX45/100
      • CMX160 SERIES
      • CDLD/CDLS SERIES
    • KITZ SCT
    • PROSYS >
      • Single Wafer Process Systems
      • Batch Process Systems
      • Other Systems
    • ECOSYS
    • BAG FILTRATION SYSTEMS >
      • SELF-CLEANING FILTER SYSTEMS
  • ABOUT US
  • PAYMENT MODE
  • MAIL FORM
  • CONTACT US
  • LATEST UPDATE